This volume deals with the technologies of crystal fabrication, of crystal machining, and of epilayer production and is the first book on industrial and scientific aspects of crystal and layer production. The major industrial crystals are treated: Si, GaAs, GaP, InP, CdTe, sapphire, oxide and halide scintillator crystals, crystals for optical, piezoelectric and microwave applications and more. Contains 29 contributions from leading crystal technologists covering the following topics: * General aspects of crystal growth technology * Silicon * Compound semiconductors * Oxides and halides * Crystal machining * Epitaxy and layer deposition Scientific and technological problems of production and machining of industrial crystals are discussed by top experts, most of them from the major growth industries and crystal growth centers. In addition, it will be useful for the users of crystals, for teachers and graduate students in materials sciences, in electronic and other functional materials, chemical and metallurgical engineering, micro-and optoelectronics including nanotechnology, mechanical engineering and precision-machining, microtechnology, and in solid-state sciences.(1993) the appearance of dislocation clusters is related to concavely curved regions of the solid/liquid interface exhibiting local maxima of thermal stress. ... potential of the different components including intrinsic defects due to a mechanical (stress field) or electrical interaction. ... 14.2.4 PRINCIPLES OF NATIVE-DEFECT CONTROL According to the phase diagram of ... 1990; about 1019 cma3 after Hurle 1999). thermal shock remelting propagation penetration thermal stress inducedanbsp;...
|Title||:||Crystal Growth Technology|
|Author||:||Hans J. Scheel, Tsuguo Fukuda|
|Publisher||:||John Wiley & Sons - 2009-07-31|