Dry processing for submicrometer lithography

Dry processing for submicrometer lithography

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A schematic diagram is shown in Figure 1. The circular plate ... The vacuum chamber was pumped through a hole in the upper part of the vacuum chamber by a rotary vane mechanical pump; the base pressure in these experiments was as low as 30 mT. The laser scattering apparatus consisted of an excimer pumped dye laser (Lambda Physik FL 2002) which probed the region between the electrodes.

Title:Dry processing for submicrometer lithography
Author:James Bondur, Alan R. Reinberg, Society of Photo-optical Instrumentation Engineers, North Carolina State University. Center for Advanced Electronic Materials Processing, University of Wisconsin--Madison. Engineering Research Center for Plasma-Aided Manufacturing
Publisher:Society of Photo Optical - 1990


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